METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION IN CHARGED PARTICLE BEAM SYSTEMS

摘要

A charged particle beam system is disclosed, comprising:a charged particle beam generator for generating a beam of charged particles;a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles;a source for providing a cleaning agent;a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element;;wherein the charged particle optical element comprises:a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, andat least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element,;wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture.;Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.