首页> 外国专利> METHOD AND APPARATUS FOR ADJUSTING PROCESS CONTROL PREDICTION MODEL AND PROCESS CONTROLLER

METHOD AND APPARATUS FOR ADJUSTING PROCESS CONTROL PREDICTION MODEL AND PROCESS CONTROLLER

机译:用于调整过程控制预测模型和过程控制器的方法和装置

摘要

The present disclosure provides a method and an apparatus for adjusting a process control prediction model, and a process controller. In an embodiment, the method includes: determining, based on controlled variable data in process control data obtained through real-time monitoring, whether a prediction performance of the process control prediction model is lower than a reference performance; and when the prediction performance is determined to be lower than the reference performance, using manipulated variable data in the process control data monitored to adjust the process control prediction model. By way of the method, a re-test does not need to be executed to re-identify a model so as to eliminate a mismatch of the process control prediction model, thereby eliminating an influence of fluctuation introduced by addition of an excitation signal during the re-testing.
机译:本公开提供了一种用于调整过程控制预测模型的方法和装置和过程控制器。在一个实施例中,该方法包括:基于通过实时监视获得的过程控制数据中的受控变量数据确定,过程控制预测模型的预测性能是否低于参考性能;并且当确定预测性能低于参考性能时,在监视过程控制数据中使用操纵可变数据来调整过程控制预测模型。通过该方法,不需要执行重新测试以重新识别模型,以便消除过程控制预测模型的不匹配,从而消除了通过添加激励信号期间引入的波动的影响重新测试。

著录项

  • 公开/公告号US2021232106A1

    专利类型

  • 公开/公告日2021-07-29

    原文格式PDF

  • 申请/专利权人 SIEMENS AKTIENGESELLSCHAFT;

    申请/专利号US201817259672

  • 发明设计人 BO WEN;ZHU NIU;SHUN JIE FAN;

    申请日2018-07-13

  • 分类号G05B13/04;

  • 国家 US

  • 入库时间 2022-08-24 20:14:02

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