Fabrication of tunneling junctions with nanopores for molecular recognition

摘要

Embodiments of this technique enable improved and more reliable tunneling junctions and methods for manufacturing tunneling junctions.The problem of electrically shorting may be reduced by depositing electrodes with sharp sidewalls and corners but instead inclined or curved sidewalls.The layer deposited on the electrode layer can then properly cover the underlying electrode layer, thereby reducing or preventing shorting.In addition, two insulating materials may be used as dielectric layers to reduce the possibility of imperfect coverage and the possibility of peeling.In addition, the electrodes may be tapered from the contact area to the junction area to provide a thin electrode in which holes are patterned while the thick contact area reduces sheet resistance.The electrodes may also be patterned to be narrow in the contact area and narrowed in the junction area.Diagram