embedded image wherein n1, n2, Rc1, and Rc are defined in claim 1. "/> Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compound
首页> 外国专利> Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compound

Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compound

机译:化学扩增型阳性光敏树脂组合物,一种光敏干膜,一种用于制造光敏干膜的方法,一种制造图案化抗蚀剂膜的方法,一种用基板制造模板的方法,以及制造镀层成型产品的方法和巯基化合物

摘要

A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than the top (the side proximal to the surface of a resist layer) in the nonresist portion when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate having a metal surface using the composition. A mercapto compound having the formula (C) shown below is added to the composition and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation and a resin the solubility of which in alkali increases under the action of acid:; embedded image wherein n1, n2, Rc1, and Rc are defined in claim 1.
机译:一种化学放大的正型光敏树脂组合物,其能够抑制“脚踏”的发生,其中底部的宽度(支撑件表面的侧面的侧面)变得比顶部窄(侧面侧面到A的表面近侧当用作镀制品的模板的抗蚀剂图案形成在具有金属表面的金属表面的金属表面上时,在非耐受部分的抗蚀剂层中。将下面所示的式(C)的巯基化合物加入到组合物中,并包括在暴露于照射的活性射线或辐射时产生酸的酸发生器,并且树脂在碱的作用下在碱的作用下增加的树脂: <化学ID =“Chem-US-00001”> “嵌入图像”文件=“US11061326-20210713-C00001.gif”他=“15.32mm”ImgContent 其中N1,N2,R C1 和R c 在权利要求1中定义。

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