Susceptor preventing backside deposition and apparatus for deposition including the same

摘要

The present invention provides a deposition chamber; a susceptor disposed in the deposition chamber, having a body part on which a substrate can be mounted and a flow path part formed on a part of the body part to allow an inert gas to flow to at least a lower edge of the substrate; and a showerhead disposed in the deposition chamber, disposed on either one of left and right sides of the backside deposition prevention susceptor, configured to supply a deposition process gas onto the substrate; It provides a deposition apparatus comprising a.