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HALF-TIME PREPARATION AND PROCEDURES FOR THE PREPARATION OF A HALF-TIME PREPARATION

机译:编制半时间准备的半场时间准备和程序

摘要

A process for the production of a semiconductor device involves the application of a plasma to a section of a metal dicalcogen film. The film contains a first metal and a Chalkogen, selected from the group of S, Se, Te and combinations thereof. After application of the plasma, a metal layer with a second metal is formed over the section of the metal diachalcogene film.
机译:用于制备半导体器件的方法涉及将等离子体施加到金属二硫型膜的一部分中。该薄膜含有第一金属和光链,选自S,Se,Te及其组合。在施加等离子体之后,在金属碳酸乙烯膜的截面上形成具有第二金属的金属层。

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