Compensation for imaging deflection in particle beam lithography machines using a convolution kernel

摘要

PROBLEM TO BE SOLVED: To provide a technique of calculating an exposure pattern used to compensate for deflection of image formation onto a target from a pattern demarcating device on the basis of a desired value of a limited dimension along at least one direction in an image area on a target so that a different type reference drawing tool suits by exposing a desired pattern onto the target in a charged particle multi-beam processing device.SOLUTION: A desired pattern is given as a graphical display suitable for a reference tool such as raster graphics on an image area on a target. On the basis of an element of the graphical display, a convolution kernel which describes mapping onto a pixel group with a nominal position of the element set as a center is used. A nominal exposure pattern is calculated by the convolution of the graphical display based on the convolution kernel, and the nominal exposure pattern is suitable for creating a nominal dose distribution on the target when exposure is performed by the processing device.SELECTED DRAWING: None