SILIZIUM INJECTOR FOR THE HALF-LIGHT INDUSTRY

摘要

An injector (1), which is used in the production of semiconductor components for introducing process gas into chambers, consists of silicon and has a channel (2), which comprises at least one widened region (3, 7, 10, 11, 24, 25) or a constriction in the form of an annular rib (8), and so particles contained in the process gas that have been formed by the flaking off of deposits that have formed on the walls of the channel (2) are separated from the process gas and are kept back in the injector (1), in particular by growing on the inner surface of the channel (2), and do not escape from the injector (1).