首页> 外国专利> JOINING FILM, TAPE FOR WAFER PROCESSING, METHOD FOR PRODUCING JOINED BODY, AND JOINED BODY

JOINING FILM, TAPE FOR WAFER PROCESSING, METHOD FOR PRODUCING JOINED BODY, AND JOINED BODY

机译:加入薄膜,胶带用于晶片加工,生产连接体的方法,以及连接的主体

摘要

The invention provides a joining film having sufficient connection heat resistance and high reliability, for which a joining process of joining a semiconductor element and a substrate is simple and easy, a tape for wafer processing, a method for producing a joined body, and a joined body.;Disclosed is a joining film 13 for joining a semiconductor element 2 and a substrate 40, the joining film having an electroconductive joining layer 13a formed by molding an electroconductive paste containing metal fine particles (P) into a film form; and a tack layer 13b having tackiness and being laminated with the electroconductive joining layer. The tack layer 13b is thermally decomposed by heating at the time of joining, the metal fine particles (P) of the electroconductive joining layer 13a are sintered, and thereby the semiconductor element 2 and the substrate 40 are joined.
机译:本发明提供一种具有足够的连接耐热性和高可靠性的连接膜,其用于连接半导体元件和基板的连接过程简单且容易,用于晶片处理的带,一种用于制造连接体的方法,以及加入的方法身体。所公开的是用于连接半导体元件 13 / B>的连接膜 13 / b>,具有导电连接层的连接膜 40 。 b> 13 / b> 通过将含有金属细颗粒(p)的导电浆料模塑成薄膜形式而形成;并且具有粘性并与导电连接层层压并与导电连接层层叠的粘性层 13 / b> B 。通过在连接时加热,导电连接层的金属细颗粒(P)在加热时热分解Tack层 13 / B> B 烧结,从而连接半导体元件 2 和基板 40

著录项

  • 公开/公告号US2021189197A1

    专利类型

  • 公开/公告日2021-06-24

    原文格式PDF

  • 申请/专利权人 FURUKAWA ELECTRIC CO. LTD.;

    申请/专利号US202117195590

  • 申请日2021-03-08

  • 分类号C09J9/02;C09J7/25;C09J7/38;B32B7/12;B32B15/04;B32B37/12;H01L21/683;C09J7;H01B1/22;B32B27;B32B27/18;C09J201;H01B1;B32B5/18;

  • 国家 US

  • 入库时间 2022-08-24 19:32:08

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