Bottom-up conformal coating and photopatterning on PAG-anchored surfaces

摘要

Materials and methods for immobilizing a photoacid generator on a semiconductor substrate are provided. The PAG-containing monomer is copolymerized with the monomer so that the polymer can bind to the surface, and optionally with the monomer to enhance solubility to produce the PAG-containing polymer. The PAG-containing monomer can be coated on the surface, where the immobilized PAG can then be used to pattern the material coated on top of the immobilized PAG, allowing direct patterning without the use of photoresist. , process steps and costs can be reduced. The disclosed materials and processes can be used to create conformal coatings of controlled thickness.