Removable opaque coating for accurate optical topography measurement of transparent film top surfaces

摘要

A method of using a removable opaque coating for accurate optical topography measurements on the top surface of a transparent film comprises depositing a high reflectivity coating on the top surface of a wafer, measuring the topography on the high reflectivity coating, the wafer removing the high reflectivity coating from the The highly reflective coating includes an organic material. Highly reflective coatings contain refractive index values between 1 and 2. The highly reflective coating includes complex wavelengths greater than one at 600 and 35 nanometers. The highly reflective coating reflects at least 20 percent of the incident light. Upon deposition, the highly reflective coating maintains the underlying pattern topography at a resolution of 40 x 40 micrometers. The highly reflective coating does not cause destructive stress on the wafer.