PATTERN GENERATORS EMPLOYING PROCESSORS TO VARY DELIVERY DOSE OF WRITING BEAMS ACCORDING TO PHOTORESIST THICKNESS, AND ASSOCIATED METHODS

摘要

Multi-beam pattern generators, and related methods, using processors to change the delivered dose of writing beams, depending on photoresist thicknesses, are disclosed. The pattern generator can write the pattern over a substrate having a photoresist that is sensitive to the writing beams. The pattern may be written in individual writing cycles in which the writing beams write at least a portion of the pattern at writing pixel locations. The beam actuator of the pattern generator can independently direct the lighting beams to the lighting pixels to deliver individual pixel doses during each lighting cycle. The delivered pixel doses depend on one or more approaches using one or more of the actuator dwell times, pulse duration emitted, pulse frequency emitted, and pulse intensity emitted. , Can be adjusted according to the thickness of the photoresist at various lighting pixel locations. In this way, additional dimensional control is provided for substrates with variable photoresist thicknesses.