PATTERN GENERATORS EMPLOYING PROCESSORS TO VARY DELIVERY DOSE OF WRITING BEAMS ACCORDING TO PHOTORESIST THICKNESS, AND ASSOCIATED METHODS

摘要

photoresist thickness in a way, the lighting beam (writing beam) which is delivered by a dose (dose) for the change to the processor using a multi-beam pattern generators, and associated methods are disclosed is. Pattern generator may be a lighting pattern on a substrate having a photoresist sensitive for, lighting beams. Pattern, the lighting beam can (written) be written in the individual lighting cycle (writing cycle) for writing at least a portion of the lighting pattern in the pixel positions (pixel writing location). Actuator beam (beam actuator) of the pattern generator, it is possible to independently direct the lighting beam for lighting pixels in order to transfer the individual pixels for each dose of the lighting cycle. Delivered pixel dose are, according to the actuator dwell time of (dwell times), the pulse duration that is released, the pulse frequency being emitted, and using the release of one or more than one of the pulse intensity (intensity) is one or approach of the excess , it can be adjusted according to the thickness of the photoresist in a variety of lighting the pixel location. In this way, there is provided an additional control dimension (dimensional control) for the substrate having the photoresist variable thickness. ;