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Base material with infrared reflection multilayer film and manufacturing method of base material with infrared reflection multilayer film

机译:具有红外反射多层薄膜的基础材料和红外反射多层膜的基材制造方法

摘要

PROBLEM TO BE SOLVED: To provide a base material with an infrared-reflective multilayer film having stain resistance, which is comprised of an inorganic material that is highly reflective to infrared light and highly transparent to visible light, and features high heat dissipation efficiency, high hardness, and long-term weatherability.SOLUTION: A base material 1 with an infrared-reflective multilayer film is provide, comprising a base material 10, infrared-blocking inorganic film 20, low refractive index inorganic film 30, and high refractive index inorganic film 40 laminated in the described order. Preferably, the infrared-blocking inorganic film 20 and the low refractive index inorganic film 30 contain silica nanoparticles, and the high refractive index inorganic film 40 contains niobium oxide nanoparticles and nanodiamond nanoparticles.SELECTED DRAWING: Figure 1
机译:要解决的问题:提供一种具有具有抗污性的红外反射多层膜的基材,其由无机材料组成,该无机材料具有高度反射到红外光和可见光高度透明的,并且具有高散热效率,高硬度和长期耐候性。提供一种具有红外反射多层膜的基材1,包括基材10,红外阻断无机膜20,低折射率无机膜30和高折射率无机膜40以所描述的顺序层压。优选地,红外线阻断无机膜20和低折射率无机膜30含有二氧化硅纳米颗粒,并且高折射率无机膜40含有氧化铌纳米粒子和纳米金刚胺纳米颗粒。如图1所示:图1

著录项

  • 公开/公告号JP6877180B2

    专利类型

  • 公开/公告日2021-05-26

    原文格式PDF

  • 申请/专利权人 島田 誠之;

    申请/专利号JP20170034213

  • 发明设计人 島田 誠之;

    申请日2017-02-25

  • 分类号G02B5/26;G02B5/28;G02B5/22;B32B7/023;B32B9;

  • 国家 JP

  • 入库时间 2022-08-24 18:54:10

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