Self cleaning device, substrate processing apparatus, and self cleaning method of cleaning tool

摘要

PROBLEM TO BE SOLVED: To suppress a liquid such as a chemical solution from gathering on a cleaning member.SOLUTION: A self cleaning device 60 comprises: a cleaning member 63 for washing a washing tool M1 for washing a substrate; and an injection part 64a which emits a jet of liquid toward the cleaning member or washing tool. The cleaning member has a cleaning face 63a for washing the washing tool by pressing the cleaning face against the washing tool; the cleaning face has a tilt with respect to a horizontal plane.SELECTED DRAWING: Figure 4