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Mask and that adheres to the face

机译:面具并粘附在脸上

摘要

The present invention relates to a facial contact mask, and more particularly, by making the side of the body part of the flat-type mask folded in a specific shape, when wearing the flat-type mask, the lift around the cheek and the chin is lowered so that it is in close contact with the face. The present invention relates to a face-contacting flat-panel mask that improves the problems of the flat-panel masks of the United States, and a face-contacting three-dimensional mask that applies this technology to a three-dimensional mask. The face contact mask according to the present invention reduces the lifting of the mask and the wearer's cheeks or chins by reducing the actual size of the installation gap of the body part or increasing the curvature around the chin. Provides a high mask. The face-adhering three-dimensional mask to which this is applied improves adhesion by applying a force in an appropriate direction to the chin and nose, thereby providing a mask having a higher function than the conventional three-dimensional mask. In addition, as the adhesion is improved, an effect of allowing the wearer to feel a stable fit is provided.
机译:面部接触掩模技术领域本发明涉及面部接触掩模,更具体地,通过使扁平型掩模的主体部分的一侧以特定形状折叠,当佩戴扁平型面膜时,脸颊周围的抬起和下巴降低,使其与面部紧密接触。本发明涉及一种面部接触的平板掩模,其改善了美国的平板面罩的问题,以及将该技术应用于三维掩模的面部接触的三维掩模。根据本发明的面接触掩模通过减少身体部件的安装间隙的实际尺寸或增加下巴周围的曲率来减小掩模和穿着者的颊板或下巴的提升。提供高面罩。通过将力施加到下巴和鼻子的适当方向上施加力来改善粘附的脸部粘附的三维掩模,从而提供比传统的三维掩模更高的功能的掩模。另外,随着粘合性得到改善,提供了允许佩戴者感觉稳定配合的效果。

著录项

  • 公开/公告号KR20210001034U

    专利类型

  • 公开/公告日2021-05-12

    原文格式PDF

  • 申请/专利权人 안재현;

    申请/专利号KR2020210000025

  • 发明设计人 안재현;

    申请日2021-01-05

  • 分类号A41D13/11;A44B6;A62B18/08;

  • 国家 KR

  • 入库时间 2024-06-14 21:34:13

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