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PITCH PATTERN CORRECTION DEVICE, PROGRAM, AND PITCH PATTERN CORRECTION METHOD

机译:俯仰模式校正装置,程序和俯仰模式校正方法

摘要

The present invention is characterized by comprising: a maximum pitch specifying unit (103) which specifies, in a voice pitch pattern, a maximum value of a pitch included in a sentence ending phrase of voice; a sentence end pitch section specifying unit (104) which, in the pitch pattern, specifies a sentence end pitch section that is a section corresponding to a sentence ending phoneme of voice, and a pitch pattern correction unit (309) which changes an utterance style of voice by correcting the pitch pattern in accordance with at least one among the specified maximum value and a pitch included in the specified sentence end pitch section, wherein the pitch pattern correction unit (309) changes the correction amount for correcting the pitch pattern in accordance with the prosody of the voice.
机译:本发明的特征在于:最大间距指定单元(103),其以语音间距图案指定语音间距图案的音调的最大值;句子结束俯仰部分指定单元(104),其在间距图案中,其指定句子结束间距部分,其是与语音的句子终端音素相对应的部分,以及改变话语样式的音调模式校正单元(309)。通过根据指定的最大值中的至少一个校正间距图案来校正特定句子结束节距部分中的至少一个来说,其中音调图案校正单元(309)改变校正量以校正按照校正桨距模式随着韵律的声音。

著录项

  • 公开/公告号WO2021090381A1

    专利类型

  • 公开/公告日2021-05-14

    原文格式PDF

  • 申请/专利权人 MITSUBISHI ELECTRIC CORPORATION;

    申请/专利号JPJP2019/043388

  • 发明设计人 KAWASHIMA KEIGO;MURAYAMA SHU;

    申请日2019-11-06

  • 分类号G10L13/10;

  • 国家 JP

  • 入库时间 2022-08-24 18:42:15

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