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RADIATION DETECTOR, METHOD OF OPERATING RADIATION DETECTOR, AND METHOD OF FABRICATING RADIATION DETECTOR

机译:辐射检测器,操作辐射检测器的方法,以及制造辐射检测器的方法

摘要

A radiation detector having a plurality of pixels is provided. A respective one of the plurality of pixels includes a base substrate(BS); a thin film transistor(TFT) on the base substrate(BS); an insulating layer(IN) on a side of the thin film transistor(TFT) away from the base substrate(BS); a photosensor(PS) on a side of the insulating layer(IN) away from the base substrate(BS); a passivation layer(PVX) on a side of the photosensor(PS) away from the base substrate(BS); a scintillation layer(ST) on a side of the passivation layer(PVX) away from the base substrate(BS); and a reflective layer(RT) on a side of the scintillation layer(ST) away from the base substrate(BS). The photosensor(PS) includes a first polarity layer(PR1) in direct contact with the passivation layer(PVX). All sides of the first polarity layer(PR1) other than a side internal to the photosensor(PS) are entirely in direct contact with the passivation layer(PVX).
机译:提供具有多个像素的辐射检测器。多个像素中的各个像素中的一个包括基础衬底(BS);基材(BS)上的薄膜晶体管(TFT);远离基底基板(BS)的薄膜晶体管(TFT)侧面的绝缘层(IN);绝缘层(IN)侧面的光电传感器(PS)远离基础基板(BS);光电传感器(PS)侧面的钝化层(PVX)远离基底基板(BS);钝化层(PVX)侧面的闪烁层(ST)远离基底基板(BS);并且在闪烁层(ST)的一侧远离基底基板(BS)的反射层(Rt)。光电传感器(PS)包括与钝化层(PVX)直接接触的第一极性层(PR1)。除了光电传感器(PS)内部的侧面之外的第一极性层(PR1)的所有侧面完全与钝化层(PVX)直接接触。

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