首页> 外国专利> METHOD OF DETERMINING ABERRATIONS IN IMAGES OBTAINED BY A CHARGED PARTICLE BEAM TOOL, METHOD OF DETERMINING A SETTING OF A CHARGED PARTICLE BEAM TOOL, AND CHARGED PARTICLE BEAM TOOL

METHOD OF DETERMINING ABERRATIONS IN IMAGES OBTAINED BY A CHARGED PARTICLE BEAM TOOL, METHOD OF DETERMINING A SETTING OF A CHARGED PARTICLE BEAM TOOL, AND CHARGED PARTICLE BEAM TOOL

机译:确定通过带电粒子束工具获得的图像中的像差的方法,确定带电粒子束工具的设置和带电粒子束工具的方法

摘要

A method of determining aberrations in images obtained by a charged particle beam tool, comprising the steps of: a) obtaining two or more images of a sample, wherein each image is obtained at a known relative difference in a measurement condition of the charged particle beam tool; b) selecting an estimated aberration parameter for the aberrations of a probe profile representing the charged particle beam used by the charged particle beam tool; c) evaluating an error function indicative of the difference between the two or more images and two or more estimated images that are a function of the estimated aberration parameter and the known relative difference in the measurement condition; d) updating the estimated aberration parameter; e) performing steps c) and d) iteratively; f) determining the final aberration parameter as the estimated aberration parameter that provides the smallest value of the error function.
机译:一种确定由带电粒子束工具获得的图像中的图像中的像差的方法,包括:a)获得的两个或多个样本的图像,其中在带电粒子束的测量条件的已知相对差异处获得每个图像工具; b)为表示带电粒子梁工具使用的带电粒子束的探针轮廓的像差选择估计的像差参数; c)评估指示两个或多个图像之间的差异的误差函数和两个或更多个估计图像,其是估计的像差参数的函数和测量条件中已知的相对差异; d)更新估计的像差参数; e)迭代地执行步骤c)和d); f)确定最终的像差参数作为提供错误函数最小值的估计的像差参数。

著录项

  • 公开/公告号WO2021078445A1

    专利类型

  • 公开/公告日2021-04-29

    原文格式PDF

  • 申请/专利权人 ASML NETHERLANDS B.V.;

    申请/专利号WO2020EP75902

  • 发明设计人 SHAO YIFENG;GOOSEN MAIKEL ROBERT;

    申请日2020-09-16

  • 分类号H01J37/153;H01J37/22;H01J37/28;

  • 国家 EP

  • 入库时间 2022-08-24 18:29:42

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