首页> 外国专利> MANIPULATOR, MANIPULATOR ARRAY, CHARGED PARTICLE TOOL, MULTIBEAM CHARGED PARTICLE TOOL, AND METHOD OF MANIPULATING A CHARGED PARTICLE BEAM

MANIPULATOR, MANIPULATOR ARRAY, CHARGED PARTICLE TOOL, MULTIBEAM CHARGED PARTICLE TOOL, AND METHOD OF MANIPULATING A CHARGED PARTICLE BEAM

机译:机械手,操纵器阵列,带电粒子工具,多射流带电粒子工具和操纵带电粒子束的方法

摘要

A manipulator for manipulating a charged particle beam in a projection system, the manipulator comprising a substrate having opposing major surfaces in each of which is defined an aperture and a through-passage having an interconnecting surface extending between the apertures; wherein the interconnecting surface comprises one or more electrodes; the manipulator further comprising a potential divider comprising two or more resistive elements connected in series, the potential divider comprising an intermediate node between each pair of adjacent resistive elements, wherein at least one resistive element is formed within the substrate so as to extend between the opposing major surfaces; wherein the intermediate node is electrically connected to at least one of the one or more electrodes.
机译:用于操纵投影系统中的带电粒子梁的操纵器,该操纵器包括在每个衬底中的衬底,在每个上具有相对的主表面,其限定了具有在孔之间延伸的互连表面的孔径和通道; 其中互连表面包括一个或多个电极; 操纵器还包括潜在分频器,该潜在分频器包括串联连接的两个或更多个电阻元件,该电位分频器包括在每对相邻的电阻元件之间的中间节点,其中至少一个电阻元件形成在基板内,以便在相对之间延伸 主要表面; 其中中间节点电连接到一个或多个电极中的至少一个。

著录项

  • 公开/公告号EP3923315A4

    专利类型

  • 公开/公告日2021-12-15

    原文格式PDF

  • 申请/专利权人 ASML NETHERLANDS B.V.;

    申请/专利号EP20200179514

  • 发明设计人 DINU GURTLER LAURA;AKSENOV GERMAN;

    申请日2020-06-11

  • 分类号H01J37/317;

  • 国家 EP

  • 入库时间 2022-08-24 22:49:36

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号