Embodiments described herein relate to a software application platform that improves the resolution of image patterns on a substrate. The application platform method includes executing an algorithm to provide different target polygons to form a pattern on the target. The minimum feature size that can be formed by the DMD is determined. For each of the target polygons smaller than the minimum feature size, it is decided to line bias or shot bias one or more target polygons to achieve an acceptable exposure contrast at the target polygon boundary. One or more target polygons that are less than the minimum feature size are biased to form a digitized pattern on the substrate. Electromagnetic radiation is transmitted to be reflected from the first mirror when the center of the first mirror of the DMD is within one or more target polygons.
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