首页> 外国专利> Susceptor for holding a semiconductor wafer with an orientation notch during the deposition of a layer on a front side of the semiconductor wafer and method for depositing the layer by using the susceptor

Susceptor for holding a semiconductor wafer with an orientation notch during the deposition of a layer on a front side of the semiconductor wafer and method for depositing the layer by using the susceptor

机译:用于在半导体晶片的前侧的层上沉积层的具有取向凹口的敏感器,以及使用基座的用于沉积层的方法

摘要

A susceptor for holding a semiconductor wafer with an orientation notch during deposition of a layer on the wafer comprises a susceptor ring having a placement area for placing the semiconductor wafer in the edge region of a back side of the semiconductor wafer and a step-shaped outer delimitation of the susceptor ring adjoining the placement area. The susceptor has four positions at which the structure differs from the structure at four further positions, the spacing from one of the four positions to the next of the four positions being 90°, the spacing from one of the four positions to the next further position being 45°, one of the four positions being a notch position at which the structure of the susceptor differs from the structure of the susceptor at the three other positions of the four positions of the susceptor.
机译:在晶片上沉积层期间,用于在晶片上沉积层的具有取向凹口的基座包括基座环,其具有用于将半导体晶片放置在半导体晶片的后侧的边缘区域中的放置区域和阶梯状外部邻接放置区域的基座环的界定。基座具有四个位置,在该位置,该位置在四个进一步的位置与结构不同,从四个位置中的一个间隔到四个位置的间隔为90°,从四个位置中的一个到下一个位置的间隔到下一个位置在45°,四个位置中的一个是凹口位置,在该凹口的位置,其中基座的结构与基座的三个其他位置的基座的结构不同。

著录项

  • 公开/公告号US10991614B2

    专利类型

  • 公开/公告日2021-04-27

    原文格式PDF

  • 申请/专利权人 SILTRONIC AG;

    申请/专利号US201816606894

  • 发明设计人 REINHARD SCHAUER;

    申请日2018-04-17

  • 分类号H01L21/687;C23C16/458;

  • 国家 US

  • 入库时间 2022-08-24 18:23:15

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