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Susceptor for holding a semiconductor wafer with an orientation notch during the deposition of a layer on a front side of the semiconductor wafer and method for depositing the layer by using the susceptor
Susceptor for holding a semiconductor wafer with an orientation notch during the deposition of a layer on a front side of the semiconductor wafer and method for depositing the layer by using the susceptor
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机译:用于在半导体晶片的前侧的层上沉积层的具有取向凹口的敏感器,以及使用基座的用于沉积层的方法
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摘要
A susceptor for holding a semiconductor wafer with an orientation notch during deposition of a layer on the wafer comprises a susceptor ring having a placement area for placing the semiconductor wafer in the edge region of a back side of the semiconductor wafer and a step-shaped outer delimitation of the susceptor ring adjoining the placement area. The susceptor has four positions at which the structure differs from the structure at four further positions, the spacing from one of the four positions to the next of the four positions being 90°, the spacing from one of the four positions to the next further position being 45°, one of the four positions being a notch position at which the structure of the susceptor differs from the structure of the susceptor at the three other positions of the four positions of the susceptor.
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