首页> 外国专利> HIGH THERMAL CONDUCTIVITY INSULATED METAL SUBSTRATES PRODUCED BY PLASMA ELECTROLYTIC OXIDATION

HIGH THERMAL CONDUCTIVITY INSULATED METAL SUBSTRATES PRODUCED BY PLASMA ELECTROLYTIC OXIDATION

机译:通过等离子体电解氧化产生的高导热绝缘金属基材

摘要

There is disclosed an insulated metal substrate, consisting of a dielectric oxide coatings of high crystallinity (>vol 90%) on aluminium, magnesium or titanium and high thermal conductivity (over 6 Wm−1K−1), formed by plasma electrolytic oxidation on a surface comprising aluminium, magnesium or titanium. There is also disclosed a plasma electrolytic oxidation process for generating dielectric oxide coatings of controlled crystallinity on a surface of a metallic workpiece, wherein at least a series of positive pulses of current are applied to the workpiece in an electrolyte so as to generate plasma discharges, wherein discharge currents are restricted to levels no more than 50 mA, discharge durations are restricted to durations of no more than 100 μs and are shorter than the durations of each the positive pulses, and/or by restricting the power of individual plasma discharges to under 15W. There is also disclosed an insulated metal substrate capable of withstanding exposure to high temperatures (over 300° C.) and thermal shock or repeated thermal cycling of over 300° C., as a result of excellent adhesion of the insulating dielectric to the metal substrate, and the mechanically compliant nature of the coating (E˜20-30 GPa). Furthermore, there is disclosed a method of making these insulated metal substrates so thin as to be mechanically flexible or pliable without detriment to their electrical insulation.
机译:公开了一种绝缘金属基板,由铝,镁或钛和高导热率(超过6wm-1k-1)的高结晶度(> VOL 90%)的介电氧化物涂层组成,通过等离子体电解氧化形成表面包含铝,镁或钛。还公开了一种等离子体电解氧化方法,用于在金属工件的表面上产生受控结晶度的介电氧化物涂层,其中至少一系列正脉冲的电流施加到电解质中的工件,以产生等离子体放电,其中放电电流限制在不超过50mA的水平,放电持续时间限于不超过100μs的持续时间,并且短于每个正脉冲的持续时间,和/或通过限制单个等离子体放电的功率15W。还公开了一种绝缘金属基材,其能够承受高温(超过300℃)和超过300℃的热冲击或重复的热循环,因为绝缘电介质与金属基板的优异粘合,以及涂层的机械柔顺性质(E~20-30 GPA)。此外,公开了一种制造这些绝缘金属基板的方法,所述绝缘金属基板可以在没有损害其电绝缘的情况下机械柔性或柔韧的。

著录项

  • 公开/公告号EP3022339B1

    专利类型

  • 公开/公告日2021-04-21

    原文格式PDF

  • 申请/专利权人

    申请/专利号EP20140742321

  • 申请日2014-07-16

  • 分类号C25D11/02;C25D21/12;C25D11/04;C25D11/26;C25D11/30;G01R19;

  • 国家 EP

  • 入库时间 2022-08-24 18:19:17

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