It is an object of the present invention to provide a method for forming a patterned perovskite layer and a perovskite layer including a pattern produced thereby. To this end, the present invention comprises the steps of forming an embossed pattern with a polymer on a substrate (step 1); Selectively depositing a first precursor for a perovskite structure on a portion of the substrate on which the embossed pattern is not formed by using a chemical vapor deposition method (step 2); Forming a patterned perovskite layer by reacting the selectively deposited first precursor with a second precursor for a perovskite structure (step 3); It provides a method of forming a lobsky layer. According to the present invention, it is possible to perform patterning with high selectivity while using a simple process, so that a high-quality patterned perovskite layer can be manufactured, and accordingly, the photoelectric conversion efficiency of a solar cell using the same can be improved. There is an effect that can improve the efficiency in the field of application, such as being able to improve.
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