首页> 外国专利> NEUTRAL SUB-LAYER FOR A BLOCK COPOLYMER AND POLYMER STACK COMPRISING SUCH A SUB-LAYER COVERED WITH A BLOCK COPOLYMER FILM

NEUTRAL SUB-LAYER FOR A BLOCK COPOLYMER AND POLYMER STACK COMPRISING SUCH A SUB-LAYER COVERED WITH A BLOCK COPOLYMER FILM

机译:用于嵌段共聚物和聚合物叠层的中性子层,包括用嵌段共聚物膜覆盖的这种子层

摘要

The invention relates to a homopolymer or (co)polymer sub-layer to be deposited on the surface of a substrate and covered by a block copolymer, said sub-layer being characterized in that it has an aliphatic chemical structure, the carbon chain of which comprising a number N of carbon atoms such that N ≥ 6 and N < 12. Such a sub-layer has a neutral surface energy with respect to each of the blocks of the block copolymer and makes it possible to prevent or delay the dewetting of a block copolymer deposited on its surface.
机译:本发明涉及待沉积在基材表面上并由嵌段共聚物覆盖的均聚物或(CO)聚合物子层,所述子层的特征在于它具有脂族化学结构,其碳链包括多个碳原子,使得n≥6和n <12.这种子层相对于嵌段共聚物的每个块具有中性表面能,并且可以防止或延迟脱模嵌段共聚物沉积在其表面上。

著录项

  • 公开/公告号WO2021064329A1

    专利类型

  • 公开/公告日2021-04-08

    原文格式PDF

  • 申请/专利权人 ARKEMA FRANCE;

    申请/专利号WO2020FR51719

  • 申请日2020-09-30

  • 分类号C08F120/18;C09D133/06;G03F7;G03F7/033;

  • 国家 FR

  • 入库时间 2024-06-14 21:24:48

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