首页> 外国专利> DEVICES, SYSTEMS, AND METHODS OF GENERATING AND PROVIDING A TARGET TOPOGRAPHIC MAP FOR FINISHING A PHOTOMASK BLANK SUBJECT TO FUNCTIONAL REQUIREMENTS ON FLATNESS

DEVICES, SYSTEMS, AND METHODS OF GENERATING AND PROVIDING A TARGET TOPOGRAPHIC MAP FOR FINISHING A PHOTOMASK BLANK SUBJECT TO FUNCTIONAL REQUIREMENTS ON FLATNESS

机译:生成和提供目标地形图的设备,系统和方法,用于整理Photomask空白,以对平坦度的功能要求

摘要

Devices, systems, and methods of generating and providing a target topographic map for finishing a photomask blank are disclosed. A method includes receiving topographic data corresponding to an uncompleted photomask blank, receiving functional specifications for flatness of an acceptable photomask blank, and generating the target topographic map for first and/or second major surfaces of the blank, which provides instructions for removing material from the first and/or second major surfaces such that the first and second major surfaces achieve a flatness that passes each functional specification. The amount of material removed reflects a reduction in material necessary to pass the functional specifications. The method further includes transmitting the target topographic map to the finishing device to utilize a finishing technique to implement changes to the photomask blank according to the target topographic map by removing the material from the photomask blank to achieve a photomask blank that passes the functional specifications.
机译:公开了用于整理光掩模坯料的生成和提供目标地形图的装置,系统和方法。一种方法包括接收与未加工的光掩模坯料相对应的地形数据,接收可接受的光掩模坯料的平坦度的功能规范,并为坯料的第一和/或第二主表面产生目标地形图,这提供了用于从中移除材料的指令第一和/或第二主表面使得第一和第二主表面实现通过每个功能规范的平坦度。除去的材料量反映了通过功能规范所需的材料的减少。该方法还包括将目标地形图发送到精加工装置,以利用精加工技术通过从光掩模坯料移除材料来利用根据目标地形图来实现对光掩模坯料的变化,以实现通过功能规格的光掩模坯料。

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