AN ETCHANT COMPOSITION FOR RUTHENIUM METAL FILM, A PATTERN FORMATION METHOD AND A MANUFACTURING METHOD OF ARRAY SUBSTRATE USING THE ETCHANT COMPOSITION, AND AN ARRAY SUBSTRATE MANUFACTURED THEREFROM

摘要

(A) periodic acid, (B) organic phonic acid, and (C) an etchant composition comprising water, a ruthenium metal film etchant composition having a pH of 2 or less, a pattern formation method using the same, and a method of manufacturing an array substrate, and An array substrate manufactured accordingly is provided.