首页> 外国专利> Direct additive synthesis from UV-induced solvated electrons in feedstock of halogenated material and negative electron affinity nanoparticle

Direct additive synthesis from UV-induced solvated electrons in feedstock of halogenated material and negative electron affinity nanoparticle

机译:从卤化材料原料和负电子亲和纳米粒子原料中的紫外诱导的溶剂化电子直接添加剂合成

摘要

In an embodiment, a system includes a three-dimensional (3D) printer, a feedstock, and a laser. The three-dimensional printer includes a platen including an inert metal, and an enclosure including an inert atmosphere. The feedstock is configured to be deposited onto the platen. The feedstock includes a halogenated solution and a nanoparticle having negative electron affinity. The laser is configured to induce the nanoparticle to emit solvated electrons into the halogenated solution to form, by reduction, a ceramic and a diatomic halogen.
机译:在一个实施例中,系统包括三维(3D)打印机,原料和激光器。三维打印机包括包括惰性金属的压板,以及包括惰性气氛的外壳。原料被配置为沉积在压板上。原料包括卤代溶液和具有负电子亲和力的纳米颗粒。激光器构造成诱导纳米颗粒将溶剂化的电子发射到卤代溶液中以通过还原,陶瓷和硅藻卤素形成卤化溶液。

著录项

  • 公开/公告号US10960571B2

    专利类型

  • 公开/公告日2021-03-30

    原文格式PDF

  • 申请/专利权人 LOCKHEED MARTIN AERONAUTICS COMPANY;

    申请/专利号US201815976626

  • 发明设计人 DAVID GLEN FINDLEY;

    申请日2018-05-10

  • 分类号B28B1;B33Y10;C01B32/26;B33Y30;B33Y70;C01B32/05;C09D11/033;C09D11/037;C01B32/963;

  • 国家 US

  • 入库时间 2022-08-24 17:58:42

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