首页> 外国专利> METHOD FOR PRODUCING A RELIEF-TYPE DECORATION ON A SURFACE OF A CERAMIC PRINTING MEDIUM

METHOD FOR PRODUCING A RELIEF-TYPE DECORATION ON A SURFACE OF A CERAMIC PRINTING MEDIUM

机译:在陶瓷印刷介质表面上产生释放型装饰的方法

摘要

The invention relates to a method for producing a relief-type decoration on a surface of a ceramic printing medium, comprising the steps of: a) providing a ceramic printing medium (101); b) discharging, by means of a plurality of nozzles of a first inkjet printer, drops of a first glaze suspension which comprises, in the form of particles, at least one glaze material (111) containing frit onto part of the surface and confining the drops deposited on the part such that at least partially confined glaze material forms semi-cylindrical elevations, wherein, while the drops are being discharged, a continuous unidirectional relative movement between the nozzles and the printing medium occurs; and c) firing the ceramic printing medium in order to produce the relief-type decoration on the surface of the printing medium 101; wherein the drops are discharged and confined in step (b) such that a first glaze layer (105) comprising immediately adjacent semi-cylindrical elevations each having a base (109, 109', 109'', 109''', 109'''') and a lateral face (107, 107', 107'', 107''', 107'''') is formed, each of the longitudinal axes of said elevations extending in a first direction, wherein the bases (109, 109', 109'', 109''', 109'''') and the lateral faces (107, 107', 107'', 107''', 107'''') of said elevations overlap over part of the surface.
机译:本发明涉及一种在陶瓷印刷介质表面上产生释放型装饰的方法,包括:a)的步骤:a)提供陶瓷印刷介质(101); b)通过第一喷墨打印机的多个喷嘴排出第一釉料悬浮液,其包括以颗粒的形式,含有含有玻璃料的至少一个釉料材料(111),并限制沉积在部件上的液滴,使得至少部分限制的釉料材料形成半圆柱凸起,其中在排出液滴时,发生喷嘴和印刷介质之间的连续单向相对运动; c)烧制陶瓷印刷介质,以在印刷介质101的表面上产生释放型装饰;其中,下降被排出并限制在步骤(b)中,使得第一釉层(105)包括立即相邻的半圆柱形高度,每个凸起每个具有基座(109,109',109'',109'',109''形成'')和横向面(107,107',107'',107''',107''),所述凸起的每个纵向轴在第一方向上延伸,其中基座(109 ,109',109',109'',109''')和所述高度的107''',107',107'')和侧面(107,107',107'',107'',107'')在部分中重叠表面。

著录项

  • 公开/公告号WO2021052626A2

    专利类型

  • 公开/公告日2021-03-25

    原文格式PDF

  • 申请/专利权人 DURST PHOTOTECHNIK AG;

    申请/专利号WO2020EP25414

  • 申请日2020-09-14

  • 分类号B28B11;B28B11/04;B41J3/407;B05C19/04;B28B1;B33Y10;B33Y80;B41M5;B44C5/04;C04B41/50;E04F13/08;

  • 国家 EP

  • 入库时间 2022-08-24 17:57:02

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