首页> 外国专利> METHOD OF FORMING A COHESIVE CONNECTION BETWEEN A SEMICONDUCTOR WITH AN ALUMINIUM COATED CONTACT SURFACE AND A SHAPED METAL BODY, AS WELL AS A SEMICONDUCTOR MODULE COMPRISING AND A SHAPED METAL BODY COHESIVELY ATTACHED TO A SEMICONDUCTOR

METHOD OF FORMING A COHESIVE CONNECTION BETWEEN A SEMICONDUCTOR WITH AN ALUMINIUM COATED CONTACT SURFACE AND A SHAPED METAL BODY, AS WELL AS A SEMICONDUCTOR MODULE COMPRISING AND A SHAPED METAL BODY COHESIVELY ATTACHED TO A SEMICONDUCTOR

机译:在具有铝涂覆的接触表面和成形金属体的半导体之间形成粘性连接的方法,以及包括连接到半导体的成形金属体的半导体模块

摘要

A method of forming a cohesive connection between a semiconductor (20) comprising an aluminium coated contact surface (30) and a shaped metal body (50) comprises the following steps: placing a preform on the contact surface of the semiconductor (20), wherein the preform comprises a dried sinter paste (40) enclosing a metallic structure (60) designed as a metallic grid or wavy metallic structure, placing the shaped metal body (50) on the preform, and processing the assembled components to form the cohesive connection, wherein the processing comprises the step of at least partially removing an oxide layer on the surface of the shaped metal body (50) and/or the contact surface of the semiconductor (20) by moving the metallic structure (60) in contact with the shaped metal body (50) and/or the semiconductor (20) relative to these. The movement of the metallic structure (60) may be at an ultrasonic frequency. The processing may comprise the movement of the shaped metal body (50) relative to the semiconductor (20). The shaped metal body (50) may comprise aluminium or an aluminium alloy, or alternatively copper or a copper alloy. The processing may comprise the application of pressure and/ or temperature. The melting point of the metallic structure (60) may be higher than the melting point of the sinter paste (40). The preform is preferably low temperature melting, with the melting point of the preform being < 230 °C in particular. Highly preferred is a preform made of a low temperature melting metal or a metal alloy, such as SnAg with a melting temperature of 221°C. In particular, the metallic sintered material may be an alloy, preferably an alloy of tin and silver. The destruction of the oxide on aluminium surfaces may lead to the diffusion of the dried sinter paste (40) into the aluminium of the contact surface (30) and the shaped metal body (50), wherein this process can preferably take place at temperatures below the melting point of the dried sinter paste (40). The metallic structure (60) may also be a braided wire.
机译:在包括铝涂覆的接触表面(30)和成形金属体(50)的半导体(20)之间形成粘合连接的方法包括以下步骤:将预成型件放置在半导体(20)的接触表面上,其中预制件包括将金属结构(60)的干燥的烧结浆(40)封闭设计为金属栅格或波状金属结构,将成形的金属体(50)放置在预制件上,并加工组装部件以形成粘性连接,其中,通过将金属结构(60)与成形接触,至少部分地在成形金属体(50)和/或半导体(20)的表面上至少部分地去除氧化物层的步骤。金属体(50)和/或半导体(20)相对于这些。金属结构(60)的运动可以是超声波频率。该处理可包括相对于半导体(20)的成形金属体(50)的移动。成形金属体(50)可包括铝或铝合金,或铜或铜合金。处理可包括施加压力和/或温度。金属结构(60)的熔点可以高于烧结浆(40)的熔点。预制件优选为低温熔化,预制件的熔点特别是<230℃。非常优选的是由低温熔融金属或金属合金制成的预制件,例如熔化温度为221℃的嵌入。特别地,金属烧结材料可以是合金,优选锡和银的合金。铝表面上的氧化物的破坏可能导致干燥的烧结浆料(40)的扩散到接触表面(30)和成形金属体(50)中的铝中,其中该过程可以优选在下面的温度下进行干燥烧结浆料的熔点(40)。金属结构(60)也可以是编织线。

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