首页> 外国专利> A system that purifies low-purity hydrogen fluoride into high-purity hydrogen fluoride by using the difference in density and specific gravity of the material, and a new material that adsorbs impurities

A system that purifies low-purity hydrogen fluoride into high-purity hydrogen fluoride by using the difference in density and specific gravity of the material, and a new material that adsorbs impurities

机译:通过使用材料的密度和比重差和吸附杂质的新材料,将低纯度氟化物净化为高纯度氟化氢的系统,以及吸附杂质的新材料

摘要

The present invention is a system for purifying low-purity hydrogen fluoride into high-purity hydrogen fluoride by using the difference in density and specific gravity of the material, and as a new material for adsorbing impurities, Hydrogen fluoride produced and brought in from around the world for use in conventional semiconductor processing is unusable because of its concentration and purity. The present invention eliminates hydrogen fluoride, which has a problem as described above, from a complex purification facility. Edible oil (4) and materials with different specific gravity (10) are built into the refining container (2) and arranged in multi-level layers. Liquid hydrogen fluoride (1) is injected from the upper side of the new material (100) that adsorbs impurities composed of materials (10) having different specific gravity from cooking oil (4) in a multi-stage layer, and liquid hydrogen fluoride (1) using a specific gravity difference While sedimenting to the lower side To achieve the equilibrium of substances while confining trace impurities contained in low-purity liquid hydrogen fluoride (1) to the viscosity of the new material (100) that adsorbs impurities composed of edible oil (4) and substances having different specific gravity (10). By adsorbing and removing Characterized in that, it is characterized in that only high purity liquid hydrogen fluoride 600 is settled down to be collected or supplied to a semiconductor processing system through a pipe (3) to be used in industry. It is a new material that adsorbs impurities and a system that purifies low-purity hydrogen fluoride into high-purity hydrogen fluoride by using the difference in density and specific gravity of the material. On the other hand, the present invention is constructed by arranging in a multi-level layer by embedding the edible oil (4) and the material (10) having different specific gravity in the refining container (2). A low-purity etching gas 500 HF is injected from the lower side of the new material 100 that adsorbs impurities composed of edible oil 4 and a material 10 having different specific gravity in a multi-stage layer, and using the difference in specific gravity Etching gas (500) HF generates buoyancy against the new material (100) that adsorbs impurities composed of a material (10) having a different specific gravity from the cooking oil (4) and moves upward. To achieve equilibrium of materials while confining trace impurities contained in low-purity etching gas 500 HF to the viscosity of the new material 100 that adsorbs impurities composed of materials 10 with different specific gravity from cooking oil 4 By adsorbing and removing Characterized in that it is characterized by manufacturing only high purity etching gas (700) HF and moving it to the upper side for collection or supplying it to a semiconductor processing system through a pipe to be used in industry. It is a new material that adsorbs impurities and a system that purifies low-purity hydrogen fluoride into high-purity hydrogen fluoride by using the difference in density and specific gravity of the material. In addition, the present invention has not been derived worldwide, Characterized by a new material (100) that adsorbs impurities formed in multiple stages with two or more substances (10) having different specific gravity from the cooking oil (4). It is a new material that adsorbs impurities and a system that purifies low-purity hydrogen fluoride into high-purity hydrogen fluoride by using the difference in density and specific gravity of the material. In addition, the present invention purifies the ultra-high-purity special gas that is widely used in high-tech industries such as optical fiber manufacturing, medical equipment, LCD, LED, as well as semiconductor manufacturing. [Index] The present invention is a system for purifying low-purity hydrogen fluoride into high-purity hydrogen fluoride by using the difference in density and specific gravity of the material, and a new material for adsorbing impurities, Liquid hydrogen fluoride (1) is composed of cooking oil (4) and a substance having different specific gravity (10) inside the refining container (2) and arranged in multi-level layers, Liquid hydrogen fluoride (1) is injected from the upper side of the new material (100) that adsorbs impurities composed of materials (10) having different specific gravity from cooking oil (4) in a multi-stage layer, and liquid hydrogen fluoride (1) using a specific gravity difference Sedimentation to the lower side, To achieve equilibrium of substances while confining trace impurities contained in low-purity liquid hydrogen fluoride (1) to the viscosity of the new material (100) that adsorbs impurities composed of edible oil (4) and substances having different specific gravity (10). Adsorption removal by using the property, A new material (100) that injects low-purity etching gas (500) HF and adsorbs impurities composed of low-purity etching gas (500) HF and a material having a different specific gravity (10) using a specific gravity difference. It generates buoyancy against and moves upwards To achieve equilibrium of materials while confining trace impurities contained in low-purity etching gas 500 HF to the viscosity of the new material 100 that adsorbs impurities composed of materials 10 with different specific gravity from cooking oil 4 Adsorption removal using the property Manufacturing only high-purity etching gas 700 HF and moving it to the upper side for collection or supplying it to a semiconductor processing system through a pipe to be used in industry, A new material (100) that adsorbs impurities composed of multiple stages with two or more substances (10) having different specific gravity from the edible oil (4),
机译:本发明是一种用于通过使用材料的密度和比重的差异净化低纯度氟化氢到高纯度氟化氢中的系统,以及作为吸附杂质的新材料,产生并从周围产生的氟化氢氟化氢在传统的半导体加工中使用的世界是不可用的,因为它的浓度和纯度。本发明消除了从复杂的净化设施中如上所述存在的氟化氢。可食用的油(4)和具有不同比重(10)的材料内置于精炼容器(2)中,并以多级层布置。液体氟化氢(1)从新材料(100)的上侧注入,其吸附由具有不同比重的材料(10)与多级层中的油(4)具有不同比重的杂质,以及氟化氢( 1)使用比重差异在沉淀到下侧,以实现物质的平衡,同时将低纯度氟化氢氟化氢(1)中包含的痕量杂质限制在新材料(100)的粘度上,其吸附于可食用的杂质油(4)和具有不同比重(10)的物质。通过吸附和去除特征在于,其特征在于,仅通过管(3)在工业中使用的管(3)收集或供应高纯度氟化氢600以将其稳定或供应到半导体处理系统。它是一种新的材料,可通过使用材料的密度和比重差异将低纯度氟化物净化为高纯度氟化氢的杂质和系统。另一方面,通过将可食用的油(4)嵌入在精炼容器(2)中,通过将具有不同比重的材料(10)嵌入多液层层中,构造本发明。从新材料100的下侧注入低纯度蚀刻气体500HF,其吸附由可食用的油4和在多级层中具有不同比重的材料10的杂质,并使用比重蚀刻的差异气体(500)HF对新材料(100)产生浮力,其吸附由烹饪油(4)具有不同比重的材料(10)组成的杂质并向上移动。为了达到材料的平衡,同时将低纯度蚀刻气体500hf的痕量杂质限制到新材料100的粘度,其通过吸附和除去具有不同比重的材料10具有不同比重的杂质,其特征在于它是其特征在于,制造高纯度蚀刻气体(700)Hf并将其移动到上侧,以通过在工业中使用的管子供应到半导体处理系统。它是一种新的材料,可通过使用材料的密度和比重差异将低纯度氟化物净化为高纯度氟化氢的杂质和系统。另外,本发明尚未在全球范围内衍生出来,其特征在于,一种新的材料(100),其具有在多个阶段形成的杂质,其具有来自烹饪油(4)的具有不同比重的两个或更多个物质(10)。它是一种新的材料,可通过使用材料的密度和比重差异将低纯度氟化物净化为高纯度氟化氢的杂质和系统。此外,本发明净化了超高纯度特殊气体,广泛用于光纤制造,医疗设备,LCD,LED以及半导体制造等高科技产业。 [指数]本发明是一种用于通过使用材料的密度和比重差来纯化低纯度氟化氢成高纯度氟化氢的系统,以及用于吸附杂质的新材料,氟化氢(1)是由烹饪油(4)和具有不同比重(10)的物质组成,在精炼容器(2)内并布置在多液层层中,从新材料的上侧注入液体氟化氢(1)(100 )对由多级层中的烹饪油(4)具有不同比重的材料(10)组成的杂质,以及使用比重差沉降到下侧的液体氢气(1),以实现物质的平衡在将低纯度氟化氢(1)中包含的痕量杂质限制在新材料(100)的粘度中,其吸附由可食用油(4)和具有不同特异性的物质组成的杂质重力(10)。使用该物业的吸附清除,一种注入低纯度蚀刻气体(500)HF和由具有不同重力差异的低纯度蚀刻气体(500)HF和具有不同比重(10)的材料构成的低纯度蚀刻气体(500)HF和吸附杂质。它产生浮力,向上移动,以实现材料的均衡,同时将低纯度蚀刻气体500hf的痕量杂质限制在新材料100的粘度上,其吸附由具有不同比重的材料10与烹饪油4吸附除去的杂质。使用仅使用高纯度蚀刻气体700HF并将其移动到上侧的上侧,用于通过工业中使用的管道供应到半导体处理系统,是一种新的材料(100),其吸附由多个组成的杂质具有来自可食用油(4)的具有不同比重的两种或多种物质(10)的阶段,

著录项

  • 公开/公告号KR20210032070A

    专利类型

  • 公开/公告日2021-03-24

    原文格式PDF

  • 申请/专利权人 이 석 규;이광석;

    申请/专利号KR1020190113311

  • 发明设计人 이 석 규;이광석;

    申请日2019-09-16

  • 分类号C01B7/19;

  • 国家 KR

  • 入库时间 2022-08-24 17:52:28

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