METHOD OF MANUFACTURING A REFLECTIVE MASK BLANK, REFLECTIVE MASK BLANK AND METHOD OF MANUFACTURING A REFLECTIVE MASK

摘要

[Solution means] On one main surface of the substrate, from the substrate side, a multilayer reflective film that reflects EUV light, a protective film, and an absorber film that absorbs EUV light are sequentially formed, and a conductive film is formed under the other main surface of the substrate. A reflective mask blank that is formed and a coordinate reference mark is formed on the other main surface side. [Effect] According to the present invention, defects such as phase defects that have an effect in a reflective mask made of a reflective mask blank after forming a multilayer reflective film on a substrate and after forming an absorber film on the multilayer reflective film On the other hand, the positions of defects in the multilayer reflective film, especially even if they are finer defects, can accurately grasp these positions.