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Apparatus, and process for cold spray deposition of thermoelectric semiconductor and other polycrystalline materials and method for making polycrystalline materials for cold spray deposition
Apparatus, and process for cold spray deposition of thermoelectric semiconductor and other polycrystalline materials and method for making polycrystalline materials for cold spray deposition
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机译:热电半导体的冷喷涂沉积的装置和其他多晶材料的方法及用于制备冷喷雾沉积的多晶材料的方法
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摘要
An apparatus and method perform supersonic cold-spraying to deposit N and P-type thermoelectric semiconductor, and other polycrystalline materials on other materials of varying complex shapes. The process developed has been demonstrated for bismuth and antimony telluride formulations as well as Tetrahedrite type copper sulfosalt materials. Both thick and thin layer thermoelectric semiconductor material is deposited over small or large areas to flat and highly complex shaped surfaces and will therefore help create a far greater application set for thermoelectric generator (TEG) systems. This process when combined with other manufacturing processes allows the total additive manufacturing of complete thermoelectric generator based waste heat recovery systems. The processes also directly apply to both thermoelectric cooler (TEC) systems, thermopile devices, and other polycrystalline functional material applications.
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