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HYDROPHILIC AND ZETA POTENTIAL TUNABLE CHEMICAL MECHANICAL POLISHING PADS

机译:亲水和Zeta电位可调化学机械抛光垫

摘要

In one implementation, a method of forming a porous polishing pad is provided. The method comprises depositing a plurality of composite layers with a 3D printer to reach a target thickness. Depositing the plurality of composite layers comprises dispensing one or more droplets of a curable resin precursor composition onto a support. Depositing the plurality of composite layers further comprises dispensing one or more droplets of a porosity-forming composition onto the support, wherein at least one component of the porosity-forming composition is removable to form the pores in the porous polishing pad.
机译:在一个实施方式中,提供了一种形成多孔抛光垫的方法。该方法包括用3D打印机沉积多个复合层以达到目标厚度。沉积多个复合层包括将可固化树脂前体组合物的一个或多个液滴分配到载体上。沉积多个复合层还包括将一个或多个孔隙形成组合物的液滴分配到载体上,其中孔隙率形成组合物的至少一种组分可去除以形成多孔抛光垫中的孔。

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