METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASK

摘要

A reflective mask blank includes a substrate (101), and a multilayer reflection film (102) for EUV light reflection, a protection film (103), and an absorber film (104) for EUV light absorption formed on one main surface of the substrate in that order from the substrate side, and a conductive film (105) formed on the other main surface of the substrate, and a coordinate reference mark (106) formed on the other main surface side. The reference mark (106) is used to define the position of defects found on the one main surface of the blank. Subsequent processing by patterning of the absorber film (104) can be adjusted to mitigate their effect.