首页> 外国专利> Creating arbitrary patterns on a 2-d uniform grid VCSEL array

Creating arbitrary patterns on a 2-d uniform grid VCSEL array

机译:在2-D统一网格vcsel阵列上创建任意模式

摘要

An optoelectronic device includes a semiconductor substrate and an array of optoelectronic cells, formed on the semiconductor substrate. The cells include first epitaxial layers defining a lower distributed Bragg-reflector (DBR) stack; second epitaxial layers formed over the lower DBR stack, defining a quantum well structure; third epitaxial layers, formed over the quantum well structure, defining an upper DBR stack; and electrodes formed over the upper DBR stack, which are configurable to inject an excitation current into the quantum well structure of each optoelectronic cell. A first set of the optoelectronic cells are configured to emit laser radiation in response to the excitation current. In a second set of the optoelectronic cells, interleaved with the first set, at least one element of the optoelectronic cells, selected from among the epitaxial layers and the electrodes, is configured so that the optoelectronic cells in the second set do not emit the laser radiation.
机译:光电器件包括形成在半导体衬底上的半导体衬底和一系列光电单元。电池包括第一层叠较低分布式布拉格反射器(DBR)堆叠的外延层;在下DBR叠层上形成的第二外延层,限定量子阱结构;在量子阱结构上形成的第三个外延层,限定了上部DBR堆叠;在上DBR叠层上形成的电极,可配置为将激励电流注入每个光电电池的量子阱结构中。第一组光电电池被配置为响应于激励电流发射激光辐射。在第二组光电单元中,用第一组交织,从外延层和电极中选择的光电电池的至少一个元件被配置成使得第二组中的光电单元不会发出激光器辐射。

著录项

  • 公开/公告号US10951008B2

    专利类型

  • 公开/公告日2021-03-16

    原文格式PDF

  • 申请/专利权人 APPLE INC.;

    申请/专利号US202016867594

  • 发明设计人 CHIN HAN LIN;WEIPING LI;XIAOFENG FAN;

    申请日2020-05-06

  • 分类号H01S5/183;H01L29/15;H01S5/026;H01S5/187;H01S5/42;H01S5/042;H01S5/20;

  • 国家 US

  • 入库时间 2022-08-24 17:42:41

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