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3D AND FLASH MEMORY ARCHITECTURE WITH FEFET

机译:3D和闪存架构与fefet

摘要

A 3D flash memory is provided to includes a gate stack structure comprising a plurality of gate layers electrically insulated from each other, a cylindrical channel pillar vertically extending through each gate layer of the gate stack structure, a first conductive pillar vertically extending through the gate stack structure, the first conductive pillar being located within the cylindrical channel pillar and being electrically connected to the cylindrical channel pillar, and a second conductive pillar extending through the gate stack structure, the second conductive pillar being located within the cylindrical channel pillar and being electrically connected to the cylindrical channel pillar, the first conductive pillar and the second conductive pillar being separated from each other. The 3D flash memory also includes a ferroelectric layer disposed between gate layers of the gate stack structure and the cylindrical channel pillar.
机译:提供3D闪存以包括栅极堆叠结构,该栅极堆叠结构包括彼此电绝缘的多个栅极层,圆柱形通道柱垂直地延伸穿过栅极堆叠结构的每个栅极层,第一导电柱垂直延伸穿过栅极堆叠结构,第一导电柱位于圆柱形通道柱内并电连接到圆柱形通道支柱,第二导电柱延伸穿过栅极堆叠结构,第二导电柱位于圆柱形通道支柱内并电连接到圆柱形通道支柱,第一导电柱和第二导电柱彼此分离。 3D闪存还包括设置在栅极堆叠结构的栅极层和圆柱形通道支柱之间的铁电层。

著录项

  • 公开/公告号US2021074726A1

    专利类型

  • 公开/公告日2021-03-11

    原文格式PDF

  • 申请/专利权人 MACRONIX INTERNATIONAL CO. LTD.;

    申请/专利号US202016989584

  • 发明设计人 HANG-TING LUE;

    申请日2020-08-10

  • 分类号H01L27/11597;H01L27/11587;H01L27/1159;G11C11/22;G11C8/14;G11C7/18;

  • 国家 US

  • 入库时间 2022-08-24 17:37:44

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