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Photoresist pattern reduction composition and pattern reduction method
Photoresist pattern reduction composition and pattern reduction method
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机译:光致抗蚀剂图案减少组合物和图案减少方法
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摘要
Provided is a composition for shrinking a photoresist pattern, which is capable of shrinking a photoresist pattern using a photoresist during the fabrication of a semiconductor, and to a method of shrinking a pattern using the composition, whereby a pattern to be formed can be shrunken in a photoresist-patterning process, thus remarkably decreasing the number of steps of a semiconductor fabrication process and reducing the fabrication time and costs.
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