首页> 外国专利> Improvements in or relating to the purification of halide salts obtained from metal halide reduction processes

Improvements in or relating to the purification of halide salts obtained from metal halide reduction processes

机译:从金属卤化物还原过程中获得的卤化物盐的提纯或与提纯有关

摘要

The impure chloride, bromide or iodide of a reducing metal recovered from the reduction of a metal halide with said reducing metal is purified by treating in the molten state with gaseous chlorine, bromine or iodine, respectively, to form and remove volatile halides of metal impurities in said halide. The purified halide may if desired be electrolysed to give back the reducing metal and halogen, the latter then being used to halogenate one of the metals having a volatile halide, and the halide reduced to give the desired metal and the impure halide. Metals which may be thus produced are titanium, zirconium, niobium, molybdenum, tantalum and tungsten, the two first-mentioned being referred to in detail. Reducing metals referred to are alkali metals (sodium, potassium, lithium), alkaline earth metals (calcium, strontium, barium) and magnesium. Mixtures of a halide of more than one reducing metal may be used also. A temperature of 750-1050 DEG C. is generally applicable in the case of chlorides, e.g. magnesium chloride, the temperature being high enough to ensure sufficient vapour pressure of the volatile halide, but not high enough for attack on the material of the reactor or vaporization of the halide to be purified. In the examples, electrical heating is used to melt the halide. The halogen may be preheated. Halogenation may be effected by passing the halogen into a molten bath of the halide, or by contact as a flowing film, spray or in a packed tower &c., and may be batchwise or continuous. Specifications 479,014, [Group II], and 632,564 are referred to.
机译:通过用所述气态氯,溴或碘分别在熔融态下处理,以形成和除去金属杂质的挥发性卤化物,从而纯化从用所述还原金属还原金属卤化物而回收的还原金属中的不纯的氯化物,溴化物或碘化物。在所说的卤化物中。如果需要,可以将纯化的卤化物电解以还原出还原性金属和卤素,然后将后者用于卤化具有挥发性卤化物的一种金属,然后将卤化物还原以得到所需的金属和不纯的卤化物。由此产生的金属是钛,锆,铌,钼,钽和钨,首先提及的是两种。所谓的还原金属是碱金属(钠,钾,锂),碱土金属(钙,锶,钡)和镁。也可以使用一种以上的还原金属的卤化物的混合物。对于氯化物,例如氯化钠,通常适用750-1050℃的温度。氯化镁,其温度足够高以确保挥发性卤化物具有足够的蒸气压,但又不足以侵蚀反应器的材料或使要纯化的卤化物蒸发。在实施例中,电加热用于熔化卤化物。卤素可以被预热。卤化可通过使卤素进入卤化物的熔融浴中,或通过作为流动膜的接触,喷雾或在填充塔中进行而实现,并且可以是间歇的或连续的。参考规格479,014,[Group II]和632,564。

著录项

  • 公开/公告号GB738721A

    专利类型

  • 公开/公告日1955-10-19

    原文格式PDF

  • 申请/专利权人 E.I. DU PONT DE NEMOURS AND COMPANY;

    申请/专利号GB19530033262

  • 发明设计人 KRCHMA IGNACE JOSEPH;

    申请日1953-11-30

  • 分类号C01F5/26;C01G1/06;

  • 国家 GB

  • 入库时间 2022-08-23 23:16:08

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号