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A method of electrolytically etching the surface of an alloy-type germanium junctiontransistor

机译:一种电解刻蚀合金型锗结晶体管表面的方法

摘要

864,621. Electrolytic etching of germanium junction transistors. SONY KABUSHIKI KAISHA. Aug. 30, 1957 [Aug. 31, 1956], No. 27341/57. Drawings to Specification. Classes 37 and 41. The surface of a germanium junction transistor in which the impurity element has been introduced alloyed with lead is electrolytically etched in an aqueous solution of phosphoric acid. Typically the base of an NPN germanium transistor is connected through a 200 # resistor to one pole of a battery to which the collector and emitter are each directly connected in turn for 12 seconds through a changeover switch, the other pole being connected to a platinum cathode to give a current of 500- 800 mA. in a bath of 25% phosphoric acid at 15-30‹ C. The transistor leads of nickel, " Kovar " (Registered Trade Mark) and solder are only slightly discoloured, as are the emitter and collector which are of lead-antimony or lead-arsenic alloy.
机译:864,621。锗结晶体管的电解蚀刻。索尼KABUSHIKI KAISHA。 1957年8月30日[Aug. [1956年1月31日],第27341/57号。图纸按规格。等级37和等级41。在磷酸的水溶液中电解蚀刻了其中已引入杂质元素与铅合金化的锗结晶体管的表面。通常,NPN锗晶体管的基极通过200#电阻连接到电池的一个极,集电极和发射极分别通过转换开关依次依次连接到电池的一个极12秒钟,另一极连接到铂阴极产生500- 800 mA的电流。在15%至30°C的25%磷酸浴中。镍,“ Kovar”(注册商标)和焊料的晶体管引线以及铅,锑或铅的发射极和集电极只有轻微变色。 -砷合金。

著录项

  • 公开/公告号GB864621A

    专利类型

  • 公开/公告日1961-04-06

    原文格式PDF

  • 申请/专利权人 SONY KABUSHIKI KAISHA;

    申请/专利号GB19570027341

  • 发明设计人

    申请日1957-08-30

  • 分类号C25F3/12;H01L21/3063;

  • 国家 GB

  • 入库时间 2022-08-23 18:22:03

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