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The preparation of compounds of elements of groups iii - beta, and v - beta of the periodic table, more particularly of the gallium, indium, arsenic and phosphorus

机译:制备元素周期表中第iii-beta和v-beta组元素的化合物,尤其是镓,铟,砷和磷

摘要

Aiii Bv compounds are prepared by reaction in the gaseous phase, e.g. at a pressure of 0.1 micron to 7,500 mm. Hg., of a volatile compound of an element of Group IIIb having an atomic number of at least 13, with an element or mixture of elements of Group Vb and hydrogen, at e.g. 600-1300 DEG C. and in the absence of oxidizing gases. The volatile compound of Group IIIb which may be present in mol fraction 0.01-0.15, may be a halide, alkyl or alkyl halide while the element of Group Vb may be present in quantities 0.05-0.50 mol fraction. The mol fraction of the Group Vb element is at least equal to the mol fraction of the compound of Group IIIb but preferably greater, e.g. double. The Aiii Bv compounds may be the nitrides, phosphides, arsenides and antimonides of Al, Ga and In but bismuthides and Tl compounds may also be made. Ternary and quaternary compounds such as GaAsxP1- x and GayIn1- yAsxP1- x are also possible where x and y are 1-0. Compounds of specified conductivity type and resistivity may be made by using ultra pure starting materials and adding to these or the hydrogen stream, trace amounts of impurities e.g. 1015 to 5.1020 atoms impurity per c.c. of product, such as Be, Mg, Zn, Cd, Hg, or compounds thereof for p-type conductivity or S, Se, Te, Sn, or SnCl4 for n-type conductivity. In specific embodiments GaP, InAs, AlAs, InP, Zn-doped GaAs, Sn-doped AlSb, Zn-doped GaPAs, Te-doped GaIn-AsP.ALSO:AIIIBV compounds are prepared by reaction in the gaseous phase, e.g. at a pressure of 0.1 micron to 7500 mm. Hg, of a volatile compound of an element of Group 111B having an atomic member of at least 13, with an element or mixture of elements of Group VB and hydrogen, at, e.g., 600-1300 DEG C. and in the absence of oxidizing gases. The volatile compound of Group 111B which may be present in mol. fraction 0.01 to 0.15, may be a halide, alkyl or alkyl halide while the element of Group VB may be present in quantities 0.05 to 0.50 mol. fraction. The mol. fraction of the Group VB element is at least equal to the mol. fraction of the compound of Group 111B but preferably greater, e.g. double. The AIIIBV compounds may be the nitrides, phosphides, arsenides and antimonides of Al, Ga and In but bismuthides and Tl compounds may also be made. Ternary and quaternary compounds such as GaAsxP1- x and GayIn1- yAsxP1- x are also possible where x and y are 1 to 0. Compounds of specified conductivity type and resistivity may be made by using ultra pure starting materials and adding to these or the hydrogen stream, trace amounts of impurities, e.g. 1015 to 5.1020 atoms impurity per c.c. of product, such as Be, Mg, Zn, Cd, Hg or compounds thereof for P-type conductivity or S, Se, Te, Sn, or SnCl4 for N-type conductivity. In specific embodiments GaP, InAs, AlAs, InP, Zn-doped GaAs, Sn-doped AlSb, Zn-doped GaPAs, Te-doped GaInAsP.
机译:Av Bv化合物是通过气相反应制备的。在0.1微米至7,500毫米的压力下汞,例如,原子序数至少为13的IIIb族元素的挥发性化合物与Vb族元素和氢的元素或混合物。 600-1300℃,没有氧化气体。 IIIb族的挥发性化合物可以以0.01-0.15的摩尔分数存在,可以是卤化物,烷基或烷基卤化物,而Vb族的元素可以以0.05-0.50摩尔的分数存在。 Vb族元素的摩尔分数至少等于IIIb族化合物的摩尔分数,但优选更大,例如大于或等于IIIb族。双。 Al Bv化合物可以是Al,Ga和In的氮化物,磷化物,砷化物和锑化物,但也可以制成铋和Tl化合物。当x和y为1-0时,也可以使用三元和四元化合物,例如GaAsxP1-x和GayIn1- yAsxP1-x。可以通过使用超纯起始材料,然后向其中或氢气流中添加痕量的杂质(例如杂质)来制备具有特定导电类型和电阻率的化合物。每立方厘米1015至5.1020原子杂质对于p型导电性而言,例如Be,Mg,Zn,Cd,Hg或其化合物的化合物;对于n型导电性而言是S,Se,Te,Sn或SnCl4。在特定的实施方案中,GaP,InAs,AlAs,InP,Zn掺杂的GaAs,Sn掺杂的AlSb,Zn掺杂的GaPA,Te掺杂的GaIn-AsP。ALSO:AIIIBV化合物是通过在气相中例如通过反应制备的。在0.1微米至7500毫米的压力下在例如600-1300℃且没有氧化的情况下,具有至少13个原子原子的111B族元素的挥发性化合物与VB族元素和氢的元素或混合物的Hg,气体。 111B族的挥发性化合物可以摩尔形式存在。 0.01至0.15的部分可以是卤化物,烷基或烷基卤化物,而VB族的元素可以0.05至0.50摩尔的量存在。分数。摩尔。 VB族元素的分数至少等于mol。 111B族化合物的分数,但优选更大,例如。双。 AIIIBV化合物可以是Al,Ga和In的氮化物,磷化物,砷化物和锑化物,但是也可以制备铋和T1化合物。在x和y为1到0的情况下,也可以使用三元和四元化合物,例如GaAsxP1-x和GayIn1- yAsxP1-x。可以通过使用超纯起始原料并添加这些原料或氢来制备具有特定导电类型和电阻率的化合物流中的痕量杂质,例如每立方厘米1015至5.1020原子杂质对于P型电导率而言,例如Be,Mg,Zn,Cd,Hg或其化合物的产物,对于N型电导率而言是S,Se,Te,Sn或SnCl4的形式。在特定实施例中,GaP,InAs,AlAs,InP,Zn掺杂的GaAs,Sn掺杂的AlSb,Zn掺杂的GaPA,Te掺杂的GaInAsP。

著录项

  • 公开/公告号FR1323371A

    专利类型

  • 公开/公告日1963-04-05

    原文格式PDF

  • 申请/专利权人 MONSANTO CHEMICALS;MONSANTO CHEMICAL COMPANY;

    申请/专利号FR19620898785

  • 发明设计人

    申请日1962-05-25

  • 分类号C01B25/06;C01B25/08;

  • 国家 FR

  • 入库时间 2022-08-23 17:05:24

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