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device for mounting in a deposition of semiconductor material from the gas phase to stabfoermigen traegern from semiconductor material structure and method of manufacturing the same

机译:用于将气相中的半导体材料沉积到半导体材料结构中的稳定剂的装置及其制造方法

摘要

PICT:0983322/C1/1 The carbon holders, used to support the ends of a longitudinally extending carrier of a semi-conducting material, are given a compact coating of an ultra-pure element of Group IV having atomic weight less than 80, e.g. C, Si, or Ge. The coating is stated to prevent the absorption in the carbon holder of, e.g. traces of phosphorus, which impair the properties of the semi-conductor carrier. The apparatus of the type described in Specification 861,135 comprises a quartz dome 4 mounted on a water-cooled base 5, housing two semi-conductor elements 2, 3 supported in the carbon holders 11, 12. These are connected to a power source, whereby the carriers and bridging piece 6 are electrically heated. Carbon is deposited on the holders by admitting through a tube 13 a mixture of pure hydrocarbons (cyclohexane, benzene) and N, by which cracked products are formed and pure C is deposited. Alternatively, Si or Ge are deposited from a mixture of hydrogen and their halide compounds, e.g. SiCl4 or silico-chloroform using a temperature of 1,100 DEG to 1,200 DEG C. for Si and 850 DEG C. for Ge. German Specification 865,160 also is referred to.ALSO:The carbon holders, used to support the ends of longitudinally extending carriers of semiconducting material, are given a compact coating of an ultra-pure element of Group IV of atomic weight less than 80, e.g. C, Si or Ge. The coating prevents absorption in the carbon holder of, e.g., traces of phosphorus, which impair the properties of the semi-conductor carrier. The apparatus of the kind described in Specification 861,135 comprises a quartz dome mounted on a water-cooled base 5, housing two semi-conductor elements 2, 3 supported in the carbon holders 11, 12 which are connected PICT:0983322/C6-C7/1 through tubes 7 and 8 (the latter insulated from the base) to a power source, whereby the elements 2, 3 and bridging piece 6 are electrically heated. The holders may be coated with ultra-pure carbon by passing in through tube 13 hydrocarbons and N, by which cracked products including pure C are formed and the latter coated on the holder. Alternatively Si or Ge may be deposited from their halide compounds and hydrogen, at a temperature of 1100-1200 DEG C. for Si, and 850 DEG C. for Ge. German Specification 865,160 also is referred to.
机译:为支撑半导体材料的纵向延伸载体的端部的碳保持器提供了原子团小于80的IV类超纯元素的致密涂层,例如C,Si或Ge。据称该涂层可防止例如碳纤维吸收在碳保持器中。微量的磷,会损害半导体载体的性能。规范861,135中描述的类型的设备包括安装在水冷基座5上的石英圆顶4,该石英圆顶4容纳两个支撑在碳保持器11、12中的半导体元件2、3。它们连接到电源,从而托架和桥接件6被电加热。通过使碳纤维通过管13进入纯净的碳氢化合物(环己烷,苯)和氮的混合物中,从而将碳沉积在支架上,从而形成裂解产物并沉积纯碳。可选择地,Si或Ge是由氢和它们的卤化物例如镁的混合物沉积的。使用SiCl 4或硅氯仿,其中Si的温度为1100〜1200℃,Ge的温度为850℃。还参考德国规范865,160。ALSO:用于支撑半导体材料的纵向延伸载体端部的碳保持器,被涂有原子质量小于80的IV族超纯元素的致密涂层,例如原子质量小于80。 C,Si或Ge。该涂层防止了在碳保持器中吸收例如微量的磷,这损害了半导体载体的性能。规范861,135中描述的设备类型包括安装在水冷基座5上的石英圆顶,该石英圆顶容纳两个支撑在碳保持器11、12中的半导体元件2、3,它们连接在一起

著录项

  • 公开/公告号DE000001205950A

    专利类型

  • 公开/公告日1965-12-02

    原文格式PDF

  • 申请/专利权人 SIEMENS AG;

    申请/专利号DES0074363A

  • 发明设计人 REUSCHEL DR PHIL NAT KONRAD;

    申请日1961-06-16

  • 分类号

  • 国家 DE

  • 入库时间 2022-08-23 15:06:40

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