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Galvanic deposition of a chromium microcracked structure by means of tension to copper-plated or nickel-plated sheet
Galvanic deposition of a chromium microcracked structure by means of tension to copper-plated or nickel-plated sheet
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机译:通过对铜镀层或镍镀层的拉力,铬微裂纹结构的电沉积
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摘要
A micro-cracked chromium layer is electro-deposited on an object, e.g. on a nickel electroplated layer applied over a copper flash to a steel body, in a single stage from a plating bath containing 225-275 g/l CrO3, 3.5-6 g/l SiF6 ion e.g. Na2 SiF6 and H2SO4 in a concentration such that the weight ratio of CrO3 to H2SO4 is 130-250; the current density is 100-300 A.S.F. and the bath temperature is 100-130 DEG F. The electrolyte may contain trivalent Cr.
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机译:将微裂纹的铬层电沉积在物体上,例如在含有225-275 g / l CrO3、3.5-6 g / l SiF6离子(例如)的镀浴中,在一个阶段中,在镀铜闪蒸层上的镍电镀层上镀镍。 Na2 SiF6和H2SO4的浓度应使CrO3与H2SO4的重量比为130-250;电流密度为100-300 A.S.F.浴温为100-130°F。电解质中可能含有三价铬。
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