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Regeneration of spent ammonium persulfate etching solutions
Regeneration of spent ammonium persulfate etching solutions
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机译:过硫酸铵蚀刻液的再生
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1,176,892. Etching. FMC CORP. 17 Jan., 1968 [17 Feb., 1967], No. 2458/68. Heading B6J. An etching solution containing hydrogen peroxide and sulphuric acid, which has been used to dissolve copper and which contains residual hydrogen peroxide values is reactivated by cooling to crystallize copper sulphate values therefrom without substantially reducing the amount of residual hydrogen peroxide and separating the crystallized material from the remaining solution. Cooling may be to temperatures from - 8‹ to +20‹ C. The etching solution may contain ammonium sulphate in which case cooling may be to temperatures from - 2‹ to + 20‹ C. The solution remaining after separation may be refortified by the addition of more H 2 O 2 and H 2 SO 4 thereto. Alternatively, more H 2 SO 4 may be added prior to cooling. The reactivated solution may be recycled to an etching station.
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机译:1,176,892。蚀刻。 FMC CORP.1968年1月17日[1967年2月17日],编号2458/68。标题B6J。通过冷却以使其中的硫酸铜值结晶化而重新活化已经被用来溶解铜并且包含残留的过氧化氢值的包含过氧化氢和硫酸的蚀刻溶液,而基本上不减少残留的过氧化氢的量并且将结晶的材料与铜分离。剩余的解决方案。冷却温度可达到-8°C至+ 20°C。刻蚀溶液可能包含硫酸铵,在这种情况下,冷却温度可达到-2°C至+ 20°C。分离后残留的溶液可通过冷却而得到强化。向其中添加更多的H 2 O 2和H 2 SO 4。可替代地,可以在冷却之前添加更多的H 2 SO 4。可以将重新活化的溶液再循环到蚀刻站。
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