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A process for the preparation of a body with a transition between two different materials, in particular semiconductor materials and prepared by this process body

机译:一种制备物体的方法,该物体在两种不同的材料之间,特别是半导体材料之间过渡,并由该处理物体制备

摘要

1,051,397. Jointing. PHILIPS ELECTRONIC & ASSOCIATED INDUSTRIES Ltd. Nov. 16, 1965 [Nov. 19, 1964], No. 48621/65. Heading B3V. [Also in Division H1] Two parts are joined by the action of a beam of radiation all or most of the energy of which is chosen to be in a frequency range such that the radiation will be selectively absorbed by one of the parts. The beam is directed through that part which does not absorb the radiation and is absorbed by the second part substantially at the interface between the two parts to weld them together. The process may be carried out in air, in vacuo, in a protective atmosphere, in an etching gas or liquid, in an atmosphere repressing evaporation of volatile components, or, to bond materials such as cubic tin which are unstable to heat, in a liquid coolant. Uses suggested are the formation of hetero junctions between different semi-conductors, of metal to semi-conductor bonds, and of bonds between two pieces of the same basic semi-conductor having widely different dopant concentrations. In an example a germanium body (#E = 0À9eV) is joined to a cadmium sulphide body (#E = 2À4eV) using a ruby laser (6900 Š- 1À8 eV). Bonds may be made at spaced locations on the bodies and several wafers split from the composite body e.g. by sawing between the bonds. During bonding, carried out in air or in vacuo, the bodies may be held together under pressure and/or preheated to vary the conditions of bonding. Radiation of wavelengths 9000 Š- 18,600 Š may be used to bond germanium to gallium arsenide (#E = 1À4 eV).
机译:1,051,397。拔节。飞利浦电子及相关工业有限公司1965年11月16日[十一月。 1964年第19期],第48621/65号。标题B3V。 [也在H1区中]通过辐射束的作用将两个部分结合在一起,辐射的全部或大部分能量被选择在一个频率范围内,这样辐射将被其中一个部分选择性地吸收。光束被引导通过不吸收辐射的那部分,并且基本上在两个部分之间的界面处被第二部分吸收,以将它们焊接在一起。该方法可以在空气中,真空中,保护性气氛中,蚀刻气体或蚀刻液中,抑制挥发性成分蒸发的气氛中进行,或者与热不稳定的立方锡等材料结合。液体冷却剂。所建议的用途是在不同半导体之间形成异质结,金属与半导体之间的键合以及具有相同的掺杂剂浓度的两个相同基础半导体之间的键合。在一个示例中,使用红宝石激光器(6900Š-1-8eV)将锗体(#E = 0-9eV)连接到硫化镉体(#E = 2-4eV)。可以在主体上的隔开的位置上进行键合,并且从复合主体上分离出几个晶片,例如,晶片。通过锯切债券之间。在粘结过程中,在空气或真空中进行,可以在压力和/或预热下将物体保持在一起以改变粘结条件。波长9000Š18600Š的辐射可用于将锗键合到砷化镓(#E = 1-4 eV)。

著录项

  • 公开/公告号DE1540991A1

    专利类型

  • 公开/公告日1970-02-19

    原文格式PDF

  • 申请/专利权人 N.V. PHILIPS GLOEILAMPENFABRIEKEN;

    申请/专利号DE1965N027659

  • 发明设计人 JOHAN VAN RUYVENLODEWIJK;

    申请日1965-11-16

  • 分类号B23K9/00;

  • 国家 DE

  • 入库时间 2022-08-23 11:11:28

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