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Electroless Copper Plating.

机译:化学镀铜。

摘要

1,195,217. Coating with copper. TECHNOGRAPH Ltd. Sept.25, 1968 [Oct. 4, 1967], No.45117/67. Heading C7F. An electroless copper plating bath, which does not contain a cuprous ion complexing agent, comprises 0À002 to 0À15 mol. per litre of a water soluble copper salt, e.g. sulphate, nitrate, gluconate, pyrophosphate formate or acetate, 0À5 to 4À5 ml. per litre of 40% aqueous formaldehyde, 0À5 to 2À5 times the mols of copper per litre of a cupric ion complexing agent and an alkali metal hydroxide to bring the PH to 10À5 to 14. The complexing agent may be E.D.T.A., hydroxyethyl E.D.T.A., Rochelle salt, cream of tartar, triethanolamine, sugars, mannitol, sorbitol, ethylene glycol and gluconic acid. The solution may also include an additional reducing agent e.g. sodium sulphate, non-ionic, anionic, and cationic wetting agents, e.g. sodium lauryl sulphate, and a stabilizer e.g. sodium orthophosphate. The bath temperature is preferably 35 to 65‹C. An insulating panel to be plated may be first sensitized and seeded using stannous chloride followed by Pd, Pt, Au, Rh, Os or Ir chlorides. The coating may be subsequently electro-plated with Cu.
机译:1,195,217。镀铜。 TECHNOGRAPH Ltd. 1968年9月25日[十月[1967年4月],第45117/67号。标题C7F。一种不包含亚铜离子络合剂的化学镀铜液,其含量为0-002至0-15摩尔。每升水溶性铜盐,例如硫酸盐,硝酸盐,葡萄糖酸盐,焦磷酸盐甲酸或乙酸盐,0-5至4-5 ml。每升40%甲醛水溶液中的铜,每升铜离子络合剂和碱金属氢氧化物的摩尔数是铜的0-5至2-5倍,以使pH值达到10-5至14。该络合剂可以是EDTA,羟乙基EDTA,罗谢尔盐,牙垢,三乙醇胺,糖,甘露醇,山梨糖醇,乙二醇和葡萄糖酸的奶油。该溶液还可以包含另外的还原剂,例如碳酸氢钠。硫酸钠,非离子,阴离子和阳离子润湿剂,例如月桂基硫酸钠和稳定剂,例如正磷酸钠。浴温优选为35至65℃。首先,可以使用氯化亚锡,然后是Pd,Pt,Au,Rh,Os或Ir氯化物对要电镀的绝缘板进行敏化和接种。随后可以用Cu电镀该涂层。

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