APPARATUS FOR THE SELECTIVE SPUTTERING OF SOLID SUBSTANCES BY MEANS OF ION BOMBARDMENT ACCORDING TO THE PLASMA OR TO THE ION-BEAM PROCESS

摘要

1294697 Electron beam apparatus; ion beam apparatus ELEKTROMAT VEB 11 Nov 1969 55037/69 Heading H1D [Also in Division C7] An ion source or electron gun for ion beam or plasma sputtering apparatus comprises a cathode 10, a cylindrical anode 11 and a separate extractor unit comprising a countercathode 12, extractor electrode 24 and a protection electrode 25. A tantalum grid 27 of the extractor electrode 24 is spaced from a tungsten grid 26 of the counter-cathode 12 by an insulating cylinder 23 and spacing rings 29. Grid 27 is secured by a threaded adjustment ring 28 for easy replacement. Cathode 10, counter-cathode 12, anode 11 and a surrounding coil 13 form a Penning discharge system. An inlet 20 for cooling fluid is connected by a hose 21 to a tube in the jacket of the coil 13. For ion-beam sputtering in a high vacuum, extractor electrode 24 is connected to earth. For ion plasma sputtering, electrode 24 is given a positive potential relative to the counter-cathode 12 so that electrons are extracted and are subsequently reflected from an earthed target to ionize a gas filling. Electrode 25 is to protect electrode 24 from electron bombardment heating when effecting plasma sputtering.