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SINGLE LAYER SELF-DESTRUCT CIRCUIT PRODUCED BY CO-DEPOSITION OF TUNGSTIC OXIDE AND ALUMINUM
SINGLE LAYER SELF-DESTRUCT CIRCUIT PRODUCED BY CO-DEPOSITION OF TUNGSTIC OXIDE AND ALUMINUM
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机译:氧化钨与铝共沉积制得的单层自成电路
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摘要
A single layer self-destruct thermite material of tungstic oxide and aluminum simultaneously vacuum deposited on a substrate underlying or overlying a thin film circuit separated therefrom by an electrical insulating thin film to cause thin film circuit destruction when the destruct film is ignited by electrical energy.
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