Stabilised aq.-acidic H2O2 solns. contg. Cu ions contain =0.1 pref. 0.1-5 g/l glycol ether(s) (I) of formula R(OCH2-CH2)n-OH (in which R is 1-4C alkyl; n = 1 or 2). (I) are excellent stabilisers for H2O2 solns. used for etching, pickling and polishing Cu and its alloys. In prep. (I), R is Me, Et or Bu and n = 1 or 2.
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机译：稳定的酸性H2O2水溶液。续铜离子的含量> 0.1优先。 0.1-5 g / l式R（OCH2-CH2）n-OH的乙二醇醚（I）（其中R为1-4C烷基; n = 1或2）。 （I）是H2O2溶液的优异稳定剂。用于铜及其合金的蚀刻，酸洗和抛光。准备中。 （I），R是Me，Et或Bu，n = 1或2。
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