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Halogen-doped cadium telluride - by zone melting, for (gamma) radiation-sensitive materials and high temp semiconductors

机译:卤素掺杂碲化镉-通过区域熔化,用于(伽马)辐射敏感材料和高温半导体

摘要

Pure crystalline CdTe compsn. is doped by contact with a discrete layer of Te contg. CdCl2, CdBr2 or CdI2 and melting to form a soln. zone., heating being directed so that the soln. zone passes through the compsn. CdTe dissolves continuously on one side and recrystallises on the other side of the zone. This material is radiation sensitive and is useful as high temp. semiconductor, solar cell or material sensitive to gamma-radiation. Simple quantitative regulation of doping is possible. The amt. of dopant dissolved in the Te layer is such that the end prod. has a halogen content of 1.0-0.0001 ppm (wt.). The soln. zone passes through the compsn. at a rate is not 0.9 cm/day and the soln. zone is kept at 500-800 degrees C.
机译:纯结晶CdTe化合物。通过与Te contg的离散层接触来掺杂。 CdCl2,CdBr2或CdI2熔化后形成溶胶。加热。区域通过compsn。 CdTe在该区域的一侧连续溶解并在另一侧重结晶。这种材料对辐射敏感,可用作高温。半导体,太阳能电池或对伽玛辐射敏感的材料。掺杂的简单定量调节是可能的。 AMT。溶解在Te层中的掺杂剂的最终浓度是这样的。卤素含量为1.0-0.0001 ppm(wt。)。索恩区域通过compsn。以不大于0.9厘米/天的速度喷洒。区域保持在500-800摄氏度。

著录项

  • 公开/公告号FR2172231B1

    专利类型

  • 公开/公告日1976-11-05

    原文格式PDF

  • 申请/专利权人 US ATOMIC ENERGY COMMISSION;

    申请/专利号FR19730005201

  • 发明设计人

    申请日1973-02-14

  • 分类号B01J17/36;G01T1/24;H01L7/00;H01L15/00;

  • 国家 FR

  • 入库时间 2022-08-23 01:54:24

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